EIT 3 Rotary Target Plasma Sputtering Coater Keywords: EIT Laser, 3 Rotary Target, Plasma Sputtering Coater, Multi-Target Sputtering, Thin Film Deposition, Rotary Sample Stage, Lab Sputterer, Metal Coating, Gold Sputtering, Silver Sputtering, Copper Sputtering, Touch Screen Plasma, Laboratory Equipment A compact plasma thin film sputter (DC common type) is a 3-rotary target plasma sputtering coater. Its control panel adopts the touch screen mode. The substrate has a limit of 2″, and it places the sample with a diameter of Ø50mm. The heating temperature is 500℃. This 3-rotary target plasma sputtering coater can sputter gold, silver, and copper targets. However, it cannot sputter light metals and carbon. This machine uses a rotating sample stage to sequentially coat three layers on the same sample. The film is suitable for preparing samples in the laboratory. 3 rotary target plasma sputtering coater specifications: Input Power Single phase 220 VAC, 50 / 60Hz 700 W (including vacuum pump) For using 110 VAC, we will include a transformer for you. Output Power 1600 VDC,40 mA max Vacuum Chamber Vacuum chamber: 150 mm ID×165mm OD×150 mm H, made of high purity quartz Sealing flange made of stainless steel with flat O-ring Sample Stage with Heater Stage size: 50 mm Dia. Sputtering distance range: 25 –40 mm adjustable Rotatable stage with three sputtering positions (controlled by the touch screen) Substrate heater is built-in with a maximum heating temperature of 500 °C PID temperature controller with /- 1 °C accuracy is integrated into the touch screen Control Panel 6” color touch screen with PLC integration for easy operation Vacuum gauge, sputtering current meter, and substrate temperature control are integrated to the touch screen panel Adjustment knobs on the front panel for gas intake and sputtering current control Sputtering position, sputtering timer, and process logging are accessible from the touch screen Shield Stainless steel shield cage is included for extra protection Sputtering Targets Target size requirements: 47 mm Dia.×2.5 mm max Three targets are included in the standard package for immediate use: Au target, 47 mm Dia.×0.12 mm Ag target, 47 mm Dia.×0.5 mm Cu target, 47 mm Dia.×2.5 mm You may order various targets at CYKY Dimensions 440 mm L × 330 mm W × 455 mm H Net Weight 50 kg Warranty One year limited with lifetime support Notes HIGH VOLTAGE! Sputtering heads connect to high voltage. For safety, the operator must shut down the equipment before sample loading and target changing operations This model is not suitable for coating light metallic material such as Al, Mg, Zn, Ni, etc. due to low energy. Please consider our magnetron sputtering coater or thermal evaporation coater. More Information Get Quote #EITLaser #3RotaryTarget #PlasmaSputtering #SputteringCoater #MultiTargetSputtering #ThinFilmDeposition #LabEquipment #MetalCoating #GoldSputtering #PrecisionCoating
