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  • Plasma Sputtering Coater

  • EIT CY-PSP180G Sputterer

EIT CY-PSP180G Sputterer

$34.38 $66.7
EIT CY-PSP180G-2TA-RSH Dual Head Keywords: EIT Laser, Plasma Sputtering Coater, CY-PSP180G-2TA-RSH, Dual Head Sputtering, Rotary Heating Stage, Low Temperature Plasma, SEM Sample Preparation, Metal Coating, Thin Film Deposition, PLC Control, Touch Screen Plasma, Laboratory Sputterer, High Purity Quartz Chamber   This type of small plasma sputtering coating machine adopts a two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiments. Furthermore, using a low-temperature plasma sputtering process, there’s no high temperature during the coating, and consequently, it’s not easy to produce thermal damage. This small plasma sputtering coater uses a PLC control system. Indeed, all touch screen operation makes it easy to learn and use. Moreover, this equipment is designed with a rotatable heating sample stage, which can improve coating uniformity and film adhesion. Additionally, this small plasma sputtering instrument also uses a PLC control system, with all touch screen operation, making it easy to learn and use. Ultimately, the equipment is small in size and beautiful in appearance, while also being powerful in function, thus making it the best choice for laboratory coating experiments. Technical parameters of plasma sputtering coater: Sample stage Size 100mm Rotating speed 1~20rpm adjustable Heating temperature ≤500℃ Temperature control accuracy ±1℃ PID temperature control Plasma sputtering source Quantity 2 inchesx2 Cooling method Water cooling Vacuum chamber Chamber size φ180mm x 210mm Observation window Omnidirectional visibility Chamber material High purity quartz Open method Top cover removable Upper and lower cover material 304 stainless steel Pumping port KF16 Intake port 1/4 inch ferrule connector Power configuration Quantity DC power supplyx1 Output power Max. 150W Sputtering power 1200V Max. sputtering current 50mA Vacuum   system Vacuum pump type Dual-stage rotary vane vacuum pump Pumping port KF16 Exhaust interface KF16 Pumping rate 1.1L/s  (4m3/h) Ultimate vacuum ≥0.1Pa Vacuum measurement Resistance vacuum gauge Others Power supply AC 220V  50Hz Total power 2kW Dimension 500mm x 320mm x470mm Weight 30kg   More Information Get Quote   #EITLaser #PlasmaSputteringCoater #DualHeadSputtering #RotaryHeatingStage #LowTempPlasma #SEMSamplePrep #ThinFilmDeposition #LabEquipment #PrecisionCoating #CYPSP180G
Plasma Sputtering Coater

Plasma Sputtering Coater

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